SemiconNano 2009
Second International Workshop on Epitaxial Growth
 and Fundamental Properties of Semiconductor Nanostructures
August 9-14, 2009, Anan National College of Technology, Tokushima, Japan
INVITED-TALKS PROGRAMME
*Only first authors are shown on this programme.
  Additional authors' details can be found within the abstracs.
  You can access each abstract by clicking the title.
Monday, August 10, 2009 
9:00 Registration
    Opening ceremony (Yume-hall, City culture hall)
    Chair: S. Tsukamoto
10:00 President of Anan National College of Technology
10:10 Governor of Tokushima Prefecture
10:20 Mayor of Anan City
Session Mo.I Keynote session (Yume-hall, City culture hall)
    Chair: N. Koguchi and A. Rastelli
10:30 K-01 Keynote: A Quarter-Century of Quantum Dots: From Science to Practical Implementation
Yasuhiko Arakawa, The University of Tokyo, Japan
11:15 K-02 Keynote: Atomic scale investigation of growth processes involved in the formation of self-assembled nanostructures
Paul Koenraad, Eindhoven University of Technology, The Netherlands
12:00   Lunch and moving to Anan National College of Technology
Session Mo.II Electric structure of nanostructures (Technocenter, Anan National College of Technology)
    Chair: Y. Arakawa
13:30 O-01 Theoretical Studies of Semiconductor Quantum Dot Arrays for Intermediate Band Solar Cells
Stanko Tomić, STFC Daresbury Laboratory, UK
13:55 O-02 Atomistic Theory of Nanostructures: New Insights and Perspectives
Gabriel Bester, Max-Planck-Institut für Festkörperforschung, Germany
14:20 O-03 (111)-Grown InGaAs/GaAs Quantum Dots as Ideal Source for Entangled Photon Pairs
Andrei Schliwa, Technische Universität Berlin, Germany
14:45 Session discussion
14:55   Tea and snack
Session Mo.III Capping, stacking and alloying
    Chair: P. Koenraad
15:10 O-04 Material Deposition and Reorganization during Growth and Capping of GaAs based Nanostructures
Holger Eisele, Technische Universität Berlin, Germany
15:35 O-05 Effects of Sb exposure before during and after InAs quantum dot nucleation
José M. Ripalda, Instituto de Microelectrónica de Madrid, Spain
16:00 O-06 Alloying in Ge-Si:Si(001) Open and Closed Nanocrystalline systems
Marina Leite, California Institute of Technology, USA
16:25 O-07 Investigation on strain-compensated InGaAs/GaNAs quantum dots grown by atomic hydrogen-assisted RF-MBE
Ryuji Oshima, The University of Tokyo, Japan
16:50 Session discussion
    Welcome party (Royal Garden Hotel)
     
17:00   Moving to Royal Garden Hotel
     
18:00   Welcome party
Tuesday, August 11, 2009 
Session Tu.I Droplet epitaxy
    Chair: K. Deppert
8:30 K-03 Keynote: Self-assembly of Semiconductor Nanostructures on Solid Surface
Nobuyuki Koguchi, University of Milano-Bicocca, Italy
9:15 O-08 Droplet epitaxy on GaAs (111)A
Takaaki Mano, National Institute for Materials Science, Japan
9:40 O-09 Surface diffusion of In on GaAs (100) in droplet epitaxy
Takeshi Noda, National Institute for Materials Science, Japan
10:05 O-10 Fabrication and Optical Properties of Quantum Semiconductor Nanostructures by Droplet Epitaxy
Stefano Sanguinetti, University of Milano-Bicocca, Italy
10:30 Session discussoin
10:40   Coffee and snack
Session Tu.II Optical properties
    Chair: S. Sanguinetti
10:55 O-11 Optical Properties of InAs/GaAs Quantum Dots with a GaAs1xSbx Overgrown Layer
Jen-Inn Chyi, National Central University, Taiwan
11:20 O-12 Optical Kerr Signals of a GaAs/AlAs Multilayer Cavity with InAs Quantum Dots Embedded in Strain-Relaxed InGaAs layers
Toshiro Isu, The University of Tokushima, Japan
11:45 O-13 Structural and Optical Studies of GaNAs/GaAs Super Lattices Grown by Modulated Nitrogen Beam Epitaxy
Shyun Koshiba, Kagawa University, Japan
12:10 Session discussoin
12:20   Lunch and Poster session
Session Tu.III Nitrogen
    Chair: J. Chyi 
14:00 O-14 XPS Study of Nitridation Mechanism of GaAs (001) Surface using RF-radical Source
Shigeya Naritsuka, Meijo University, Japan
14:25 O-15 Exciton Polarization Splitting of Nitrogen Pairs in GaAs
Takashi Kita, Kobe University, Japan
14:50 O-16 Polarization properties of photoluminescence from individual isoelectronic traps in nitrogen delta-doped semiconductors: effect of host crystals
Hiroyuki Yaguchi, Saitama University, Japan
15:15 Session discussoin
15:25   Short break
Session Tu.IV Growth of III-V quantum dots
    Chair: T. Kita
15:35 O-17 Fabrication of ultra-high density InAs quantum dots on InP(311)B substrates by an accurate strain compensation technique
Kouichi Akahane, National Institute of Information and Communications Technology, Japan
16:00 O-18 Density Control of Self-Assembled InAs/GaAs Quantum Dots
Koichi Yamaguchi, The University of Electro-Communications, Japan
16:25 O-19 Withdrawn
16:50 Session discussoin
17:00   Tea and snack
Session Tu.V Characterization of electronic structure at surface and interface
    Chair: T. Katayama-Yoshida
17:15 O-20 Nano-scale profile of the dielectric constant near surfaces and interfaces: A first-principles approach
Jun Nakamura, The University of Electro-Communications, Japan
17:40 O-21 Physics of Schottky barrier at metal/high-k-oxide interfaces
Takashi Nakayama, Chiba University, Japan
18:05 O-22 Mechanism of Electron Accumulation at the Surface of InAs Thin Film Grown by Molecular Beam Epitaxy
Kiyoshi Kanisawa, NTT Corporation, Japan
18:30 Session discussoin
Wednesday, August 12, 2009 
Session We.I in situ probe
    Chair: K. Yamaguchi
8:30 O-23 Medium Energy Ion Scattering: Atomic Layer Depth Profiling of Semiconductor Nanostructures
Gavin Bell, The University of Warwick, UK
8:55 O-24 In-situ measurements of nanostructures during metal-organic vapour phase growth of compound semiconductors
Markus Pristovsek, Technische Universität Berlin, Germany
9:20 O-25 Quantitative characterization of InAs/GaAs(001) quantum dot structures by in situ X-ray diffraction
Masamitsu Takahashi, Japan Atomic Energy Agency, Japan
9:55 Session discussoin
10:05   Coffee and snack
Session We.II Nano wires
    Chair: R. Nötzel
10:25   Guidance on Awaodori excusion
O-26 Withdrawn
10:50 O-27 Epitaxial nanowire structures for generation and harvesting of light
Knut Deppert, Lund University, Sweden
11:15 O-28 Numerical simulations of VLS heteroepitaxial nanowire growth
Vivek Shenoy, Brown University, USA
11:40 O-29 Growth of III-V nanowires by selective-area MOVPE and their applications
Jun-ichi Motohisa, Hokkaido University, Japan
12:05 Session discussion
12:15   Lunch
Session We.III Theory of spinodal decomposition and growh dynamics 
    Chair: J. Mirecki-Millunchick
13:30 O-30 Computational Materials Design for Spinodal Nanotechnology as A New Class of Bottom-up Nanotechnology
Hiroshi Katayama-Yoshida, Osaka University, Japan
13:55 O-31 Modelling and Efficient Simulation of Strained Epitaxial Growth using Kinetic Monte Carlo
Peter Smereka, University of Michigan, USA
14:20 O-32 Computational study for growth of GaN on graphite as 3D growth on 2D material
Akira Ishii, Tottori University, Japan
14:45 O-33 Ab initio-based approach to surface phase diagram calculation for compound semiconductors and its application to epitaxial growth
Tomonori Ito, Mie University, Japan
15:10 Session discussion
15:20   Tea and snack
Session We.IV Surface science
    Chair: A. Ishii
15:35 O-34 Theoretical Study of a Strain-Induced Nanostructure at N/Cu(001) Surface
Shinji Tsuneyuki, The University of Tokyo, Japan
16:00 O-35 Atomic surface structure of alloyed semiconductors
Joanna Mirecki-Millunchick, University of Michigan, USA
16:25 O-36 Surface investigation of sulphur-terminated GaAs (001) substrate for supported catalysts
Tomoya Konishi, Anan National College of Technology, Japan
16:50 Session discussion
Excursion I Awaodori dance festival (Tokushima city)
     
17:00   Moving to Tokushima city by bus
Thursday, August 13, 2009 
Excursion II Tairyuji temple tour (Gondola riding)
     
8:00   Moving to Tairyuji temple by bus
Session Th.I Investigation of nanostructure properties 
    Chair: G. Bell
10:30 K-04 Keynote: New Tools for Investigating and Modifying the Structural Properties of Self-Assembled Quantum Dots
Armando Rastelli, Leibniz Institute for Solid State and Materials Research Dresden, Germany
11:15 O-37 Is “Electronic Growth” Limited to Simple Metals?
Ilan Goldfarb, Tel Aviv University, Israel
11:40 O-38 X-ray diffraction investigations of SiGe islands grown on pit-patterned Si substrates
Günther Bauer, Johannes Kepler University, Linz, Austria
12:05 Session discussion
12:15   Lunch
Session Th.II Site control of nanostructures
    Chair: G. Bauer
13:20 O-39 Tackling Today’s Challenges in Quantum Dot Materials Research: Lateral Ordering, Position, and Number Control
Richard Nötzel, Eindhoven University of Technology, The Netherlands
13:45 O-40 Evolution of Surface Corrugation during Growth of Self-Assembled InGaAs Quantum Wires on (775)B InP Substrates by Molecular Beam Epitaxy
Satoshi Shimomura, Ehime University, Japan
14:10 O-41 Site-Controlled InAs Quantum Dots Fabricated by the Nano-Jet Probe Method
Shunsuke Ohkouchi, NEC Corporation, Japan
14:35 O-42 Site-control of Quantum Dots using Congruent Evaporation Assisted by Electron Beam Irradiation
Kanji Iizuka, Nippon Institute of Technology, Japan
15:00 Session discussion
15:10   Short break
Session Th.III Quantum dots beyond III-Vs
    Chair: A. Rastelli
15:20 O-43 Self-assembled Epitaxial Quantum Dots formed by Phase Separation
Gunther Springholz, Johannes Kepler University, Austria
15:45 O-44 Synthesis, properties and assembly of shape- and composition-controlled colloidal nanocrystals
Liberato Manna, Fondazione Istituto Italiano di Tecnologia, Italy
16:10 O-45 Semiconductor nanocrystallites synthesized by pulsed laser ablation in reactive background gases and application to functional materials
Takehito Yoshida, Anan National College of Technology, Japan
16:35 Session discussion
16:45   Tea and snack
Session Th.IV Nitrides
    Chair: M. Pristovsek
17:00 O-46 Ammonothermal method of truly bulk GaN growth
Yasuo Kanbara, Nichia Corporation, Japan
17:25 O-47 Heteroepitaxial InN on GaN(0001): Interface, Strain, and Island Formation
Mao Hai Xie, The University of Hong Kong, China
17:50 O-48 Novel InN/GaN QWs Consisting of One Monolayer-thick InN Wells Embedded in GaN Matrix
Akihiko Yoshikawa, Chiba University, Japan
18:15 O-49 Nucleation of catalyst-induced GaN nanowires investigated by in-situ monitoring
Lutz Geelhar, Paul-Drude-Institut für Festkörperelektronik, Germany
18:50   Closing
Friday, August 14, 2009 
Excursion III Himeji castle tour (UNESCO World Heritage)
     
10:00   Moving to Himeji, Hyogo by bus
INVITED-POSTERS PROGRAMME
Tuesday, August 11, 12:20-14:00 
P-01 The Art of InAs/GaAs(001) MBE without buffer layer growth observed by STM
Faebian Bastiman, The University of Sheffield, UK
P-02 Competitive growth of GaAs zinc-blende islands and wurtzite nanowires on Si
Steffen Breuer, Paul-Drude-Institut für Festkörperelektronik, Germany
P-03 Real Time Observation of (2×1) Domain on InP (001) Surface During Step-Flow Growth
Seiji Fujikawa, Japan Atomic Energy Agency, Japan
P-04 In-situ spectroscopic ellipsometry monitoring of InN deposition processes on Ga-polarity GaN
Naoki Hashimoto, Chiba University, Japan
P-05 Local Photothermal Spectroscopic Measurements on Polycrystalline Silicon Solar Cells by Atomic Force Microscopy
Kenji Hara, The University of Tokyo, Japan
P-06 RF-MBE Growth and Evaluation of GaN(As)/ GaAs Super Lattices on Silicon Substrates
Tomohiko Hirashima, Kagawa University, Japan
P-07 Inter-wire coupling of the Ga-substituted Mn atomic wire on GaAs(110)
Motoi Hirayama, The University of Electro-Communications, Japan
P-08 RHEED observation of organopalladium catalyst on S-terminated GaAs(001)-(2x6) surface
Takuma Ishikawa, Anan National College of Technology, Japan
P-09 Development of CIP-Level Set Method for Interface Capturing Simulation
Hironori Ishimoto, Anan National College of Technology, Japan
P-10 Withdrawn
P-11 Size-dependent exciton g-factor in self-assembled InAs/InP quantum dots
Niek Kleemans, Eindhoven University of Technology, The Netherlands
P-12 Ripening of InAs Quantum Dots on GaAs:Si investigated with in-situ STM during MOVPE
Raimund Kremzow, Technische Universität Berlin, Germany
P-13 Theoretical Analysis of Time-Resolved Photothermal Divergence Signal on GaAs substrate
Minoru Yamamoto, The University of Tokushima, Japan
P-14 Laser-pulsed Atom Probe Tomography – A Novel Tool for the Ex-situ Analysis of Semiconductor Nanostructures
Michael Müller, University of Oxford, UK
P-15 Monolithic Selective-area Growth of Two-Color InAs QDs with a Rotational Metal Mask for Integrated Optical Devices
Nobuhiko Ozaki, University of Tsukuba, Japan
P-16 MBE Growth of InAs/GaAs Quantum Dots on Ge(001) Substrates
Takashi Seo, The University of Electro-Communications, Japan
P-17 Growth mechanism of GaAs Concentric Multiple Quantum Rings fabricated by Droplet Epitaxy
Claudio Somaschini, University of Milano-Bicocca, Italy
P-18 Towards an understanding of the electronic structure of InAsSb quantum dots
Alfonso Taboada, Instituto de Microelectrónica de Madrid, Spain
P-19 Molecular Beam Epitaxy of InAs Quantum Dots Embedded in Strain-Relaxed InGaAs Layers
Tomoya Takahashi, The University of Tokushima, Japan
P-20 Growth of multi-stacked InAs/GaNAs strain-compensated quantum dots on GaAs (001)
Ayami Takata, The University of Tokyo, Japan
P-21 in situ STM Observation of InAs Quantum Dot on GaAs(001) Surface
Teruki Teraoka, Anan National College of Technology, Japan
P-22 in situ STM observation of InAs wetting layer grown by MBE
Takashi Toujyou, Anan National College of Technology, Japan
P-23 Scanning Probe Microscopy observation on GaAs(110) cleaved surface
Nobutomo Uehara, Anan National College of Technology, Japan
P-24 Theoretical investigation on the structural stability of III-V nanowires with two different types of facets
Tomoki Yamashita, Mie University, Japan
P-25 Patterning of the GaAs Substrate by Electron Beam Induced Deposition Method
Hiroshi Yokota, Nippon Institute of Technology, Japan
P-26 Structure determination of Pd-catalyst supported on S-terminated GaN (0001) using DFT calculation
Mami Yokoyama, Tottori University, Japan